AIChE Symposium Series, Volume 93, Issue 316American Institute of Chemical Engineers, 1997 - Chemical engineering |
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Page 134
... wafer size , which will increase to 300mm ( from the current 200mm ) before the end of the decade , requiring a new ... wafer are formed many dies ( or bars or chips ) . The dies are delineated by scribe lines . As the wafer progresses ...
... wafer size , which will increase to 300mm ( from the current 200mm ) before the end of the decade , requiring a new ... wafer are formed many dies ( or bars or chips ) . The dies are delineated by scribe lines . As the wafer progresses ...
Page 136
... wafer is etched past clearing , is required due to the topography . It is not possible currently to endpoint the overetch , hence test wafers must be used . Too much overetch will damage the wafer , while too little etch will result in ...
... wafer is etched past clearing , is required due to the topography . It is not possible currently to endpoint the overetch , hence test wafers must be used . Too much overetch will damage the wafer , while too little etch will result in ...
Page 140
... wafer . Based on this model , nonlinear controllers are being developed that will be used to control the thermal response of the wafer when it is subjected to a typical setpoint trajectory as shown in Figure 5 . 5 kW Zone 11 kW Zone ...
... wafer . Based on this model , nonlinear controllers are being developed that will be used to control the thermal response of the wafer when it is subjected to a typical setpoint trajectory as shown in Figure 5 . 5 kW Zone 11 kW Zone ...
Contents
Industry Assessment | 1 |
Predictive Control | 5 |
Adaptive and Nonlinear Control Fact or Fantasy? | 9 |
Copyright | |
22 other sections not shown
Common terms and phrases
adaptive control AIChE algorithm analysis analytical applications approach auto-correlation batch behavior changes Chem Chemical Engineering chemical process chip closed-loop constraints continuous control problems control system controller design defined developed discrete disturbance dynamic equations estimation example feedback control Figure finite Grafcet horizon hybrid systems identification IEEE implementation input linear control loop manufacturing matrix measured methods model predictive control monitoring Morari multivariable neural networks nonlinear control nonlinear model nonlinear systems on-line operating optimal control output error paper machine parameters Petri net PID controllers plant Proc process control process model programming Pulp and Paper quadratic quadratic program reactor robust robust control scheduling sensors sequence set point significant simulation snack food solution specifications stability step structure synthesis TAPPI Press techniques temperature theory tion trajectory transfer function trend trol uncertainty valve variables variance vector wafer